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High Purity Titanium Sputtering Targets
Purity 99.5%, 99.95%, 99.98%, 99.995%.
Material: pure titanium titanium alloy and others
Technique:Forging, CNC machined
High purity
High purity titanium sputtering targets
Product name | Titanium Sputtering Targets for pvd coating machine |
Grade | Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. |
Origin | Baoji city, Shaanxi Province,hina |
Titanium content | ≥99.5 (%) |
Impurity content | <0.04(%) |
Density | 4.51 or 4.50 g/cm3 |
Standard | ASTM B348 , ASTM B381 |
Size | 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm; 2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm 4. Customized is available |
Technique | Forged and CNC Machined |
Application | Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry. |
The purity of the pure titanium target is one of the main performance indicators of the titanium target, because the purity of the titanium target has a great influence on the performance of the film. However, in practical applications, the purity requirements of the target material are not the same.
The impurities in the target solid and the oxygen and water vapor in the pores are the main pollution sources of the deposited film. Targets for different purposes have different requirements for different impurity contents. For example, pure aluminum and aluminum alloy targets used in the semiconductor industry have special requirements for alkali metal content and radioactive element content.
Packaging: Each titanium target is packed in a customized vacuum plastic bag, filled with foam film and pearl cotton in the middle, and a fumigation-free plywood case outside. Comply with international transportation standards, to ensure that the goods are safe in transportation.
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