Titanium Target Sputtering

Product name: Titanium target sputtering

Material: Pure titanium: GR1 GR2  

Purity >= 99.6%

Application:Hardware, decoration, tools, ceramics, golf and other coating industries.

Dimension:

Round sputtering target: Φ100×40, Φ95×45, Φ80×40, Φ90×40, Φ85×35 and other specific sizes.

Tube sputtering target: Φ70×7×L900--2000mm, Φ89.4mmX7.62mmX1728mm,Φ89.4mmX15mmX1728mm, Φ80mmX10mmX1728mm, and other specific sizes.

Plate sputtering target: T6-40×W60--800×L600--2000mm and other specific sizes.

We can customize alloy targets in different proportions according to customer needs

Material：

1) Ti/Al alloy target (67:33,50:50at%)

2) W/Ti alloy target (90:10wt%),

3) Ni/V alloy target (93:7, wt%)

4) Ni/Cr alloy target (80:20, 70:30, wt%),

5) Al/Cr alloy target (70:30,50:50at%)

6) Nb/Zr alloy target (97:3,90:10wt%)

7) Si/Al alloy target (90:10, 95:5, 98:2, 70:30, wt%)

8) Zn/Al alloy target

9) High purity chromium target (99.95%, 99.995%)

10) Al/Cr alloy target (70:30, 50:50, 67:33, at%)

11) Ni/Cu alloy target (70:30, 80:20, wt%)

12) Al/Nd alloy target (98:2wt%)

13) Mo/Nb alloy target (90:10, wt%)

14) TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)

15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)

Detailed pictures of sputtering target: